FLUOROPOLYMER FILMS PRODUCED BY SPUTTERING USING INDUCTIVELY COUPLED PLASMA ION SOURCE AND THEIR ORGANIC VAPOR SORPTION CHARACTERISTICS

A method has been developed for preparing fluoropolymer films by sputtering of polychlorotrifluroethylene using an inductively coupled plasma (ICP) ion source. Compared with the conventional sputtering using capacitively coupled plasma, this ICP-sputtering method promotes the defluorination and carbonization reactions that result in the fluorocarbon networks containing oxygen moieties, which are not included in conventionally sputtered film. The organic vapor sorption behavior of these ICP-sputtered fluoropolymer films is principally governed by their dipolar characteristics, and their sorption capacities are markedly higher than those of conventional film, whose sorption behavior is governed by its polarizability.