Multilayer X-ray mirrors prepared by triode sputtering using a new method of film thickness monitoring

Abstract Multilayer X-ray mirrors have been deposited by triode dc sputtering using a new method of thickness monitoring which is based on the dependence of the deposition rate on the target current. Thicknesses can be controlled with an accuracy to better than 0.1 A and the reproducibility is better than 1%. High efficiency W-C multilayer X-ray mirrors have been synthesized and tested at 1.54 A (CuKα), 8.34 A (AlKα) and 44.79 A (CKα). Experimental reflectivity curves were compared with the theoretical curves. The agreement between calculation and experiment is excellent. Experimental rocking curves were also compared with those of PbOD (lead octadeconate).