Diamond deposition using anX-Y stage in a d.c. plasma jet chemical vapour deposition

Diamond was deposited using the substrate scanning mode in a d.c. plasma jet of the Ar-H2-CH4 system. Film thickness profiles, SEM and Raman spectra of the diamonds obtained revealed that uniformity of film thickness, crystal size and crystal quality was improved, but the deposition rate decreased with the scanning speed and the crystal quality was worse than that made in the centre of the flame without scanning.