The New ESRF Multilayer Facility: Progress and Perspectives

In view of the increasing need for high quality multilayer based x‐ray optics the ESRF decided to upgrade its multilayer facility. During the last years a new deposition system was designed, installed, and commissioned. Since 2008 the new laboratory is operational and has produced its first optical elements for ESRF beamlines. The deposition system is based on magnetron sputtering and can cover optical surfaces up to 1000×150 mm2 with uniform or graded coatings. Four cathodes allow the use of conducting, insulating, and ferromagnetic target materials. This work will provide an overview on the machine conception and its overall performance, including a comparison with the formerly used system. It will be complemented by first fabrication results and perspectives for future projects in the framework of the ESRF Upgrade Programme.