Features of the manufacture of deep X-ray lithography masks in the siberian synchrotron and terahertz radiation center

The development of a low-cost technology to manufacture high-contrast X-ray LIGA masks is topical because this technology is important for various applied research on microstructured products with minimum element sizes of 10–50 μm, such as microfluid analytical systems, selective waveguide mesh-based elements to control terahertz (THz) radiation, microshaped optical elements for the visible range, etc. Technological particularities of mask manufacture are considered. A method to check the quality of masks is presented. Test microproducts manufactured using the produced deep X-ray lithography masks are demonstrated.