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Atomic-scale ferroic HfO2-ZrO2 superlattice gate stack for advanced transistors
Atomic-scale ferroic HfO2-ZrO2 superlattice gate stack for advanced transistors
2021
Suraj Cheema
Nirmaan Shanker
Li Chen Wang
Cheng-Hsiang Hsu
Shang Lin Hsu
Yu-Hung Liao
Matthew San Jose
Jorge Gómez
Wenshen Li
Jong-Ho Bae
Steve Volkman
Dae Woong Kwon
Yoonsoo Rho
Gianni Pinelli
Ravi Rastogi
Dominick Pipitone
Corey Stull
Matthew Cook
Brian Tyrrell
Vladimir Stoica
Zhan Zhang
John W. Freeland
Christopher J. Tassone
Apurva Mehta
Ghazal Soheli
David Thompson
Dong Ik Suh
Won-Tae Koo
Kab-jin Nam
Dong-Jin Jung
Woo-Bin Song
Chung-Hsun Lin
Seung-Geol Nam
Jinseong Heo
Costas P. Grigoropoulos
Padraic Shafer
Patrick Fay
Ramamoorthy Ramesh
Jim Ciston
Suman Datta
Mohamed Mohamed
Chenming Hu
Sayeef Salahuddin
Keywords:
Atomic units
Transistor
gate stack
Superlattice
Optoelectronics
Materials science
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