The Photopolymer Science and Technology Award

The Photopolymer Science and Technology Award No. 092100, the Best Paper Award 2009, was presented to Dario L. Goldfarba, Libor Vyklickya, Sean D. Burnsa, Karen Petrillob, John Arnoldb, Anthony Lisib, Dirk Pfeiffera, Daniel P. Sandersc, Robert D. Allenc, David R. Medeirosb, Dah Chung Owe-Yangd, Kazumi Nodae, Seiichiro Tachibanae, and Shozo Shiraie (aIBM T.J. Watson Research Center, bIBM Systems & Technology Group, cIBM Almaden Research Center, dShin-Etsu MicroSi, Inc., eShin-Etsu Chemical Co.) for their outstanding contribution published in the Journal of Photopolymer Science and Technology, 21(3), 397-404 (2008), entitled "Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography".