Preparation and Characterization of RF Magntron Sputtering CdTe Thin Film

The cadmium telluride thin film was deposited on glass substrate at room teperature by RF magnetron sputtering.The film was characterized to show the variation of its properties with the diverse deposition conditions by X-ray diffraction,UV-VIS spectrometer,scanning electrical microscope,etc.The result indicates that the deposition speed increases with the increase of deposition power and decreases with the increase of pressure.As the pressure decreases,the CdTe film's crystallinity gets worse.It is found that the cubic crystalline structure of deposited sample changes to the crystalline hexagonal CdTe phase as the power increased from 100 W to140 W.While the CdTe thin films is deposited under the pressure of 0.3 Pa,with the power of 100 W and at room temperature,the crystallinity is the best and the band gap is 1.45 eV.