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Hong Bin Jeon

Kyung Hee University

5

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PREPARATION OF WIDE BAND GAP MICROCRYSTALLINE SILICON FILM BY USING SIH2CL2

1996 Applied Physics Letters
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Low off‐state leakage current thin‐film transistor using Cl incorporated hydrogenated amorphous silicon

1996 Applied Physics Letters
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Effect of Cl incorporation on the stability of hydrogenated amorphous silicon

1995 Applied Physics Letters
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Improvement of film stability of a-Si:H deposited by RPCVD using SiH/sub 2/Cl/sub 2/

1994 PEC | World Conference on Photovoltaic Energy Conversion
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