author-photo

B. Colombeau

Chartered Semiconductor Manufacturing

32

Papers

151

Citations

Citation Trend

Filter By

Papers (26) Sort By

Journal Conference Others

Invited) Group IV Epitaxy Applications for Enabling Advanced Device Scaling

2016
Show All
- Source
- Cite
- Save
Citations (0)
surface EMG variables Motor unit recruitment strategies investigated by

2015
Show All
- Source
- Cite
- Save
Citations (0)
Fin Doping by Hot Implant for 14nm FinFET Technology and Beyond

2013
Show All
- Source
- Cite
- Save
Citations (20)
An effective metals gettering process with a cryogenic carbon implant for CMOS image sensors

2012
Show All
- Source
- Cite
- Save
Citations (2)
Physical understanding of cryogenic implant benefits for electrical junction stability

2012 Applied Physics Letters
Show All
- Source
- Cite
- Save
Citations (16)
“Abnormal” angle response curves of TW/Rs for near zero tilt and high tilt channeling implants

2012
Show All
- Source
- Cite
- Save
Citations (1)
The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding

2008 Materials Science and Engineering B-advanced Functional Solid-state Materials
Show All
- Source
- Cite
- Save
Citations (11)
The Impact of Boron Halo on Phosphorus Junction Formation and Stability

2008 Electrochemical and Solid State Letters
Show All
- Source
- Cite
- Save
Citations (0)
Interaction of the end of range defect band with the upper buried oxide interface for B and BF2 implants in Si and silicon on insulator with and without preamorphizing implant

2008 Journal of Vacuum Science & Technology B
Show All
- Source
- Cite
- Save
Citations (1)
The Formation of Ultra‐Shallow Phosphorous Doped Layers Using Vacancy Engineering

2008
Show All
- Source
- Cite
- Save
Citations (0)