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Catherine B. Labelle

Massachusetts Institute of Technology

14

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Investigation of fluorocarbon plasma deposition from c-C4F8 for use as passivation during deep silicon etching

2004 Journal of Vacuum Science and Technology
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Pulsed plasma deposition from 1,1,2,2-tetrafluoroethane by electron cyclotron resonance and conventional plasma enhanced chemical vapor deposition

2001 Journal of Applied Polymer Science
- Catherine B. Labelle
- Karen K. Gleason
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Fourier Transform Infrared Spectroscopy Study of Thermal Annealing Behavior of ECR Pulsed Plasma Deposited Fluorocarbon Thin Films from 1,1,2,2‐Tetrafluoroethane

2000 Journal of The Electrochemical Society
- Catherine B. Labelle
- Karen K. Gleason
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Pulsed plasma CVD of fluorocarbon thin films [low-k ILDs]

1999 IITC | International Interconnect Technology Conference
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Pulsed plasma-enhanced chemical vapor deposition from CH[sub 2]F[sub 2], C[sub 2]H[sub 2]F[sub 4], and CHClF[sub 2]

1999 Journal of Vacuum Science and Technology
- Catherine B. Labelle
- Karen K. Gleason
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Pulsed plasma-enhanced chemical vapor deposition from CH2F2,C2H2F4, and CHClF2

1999 Journal of Vacuum Science and Technology
- Catherine B. Labelle
- Karen K. Gleason
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Fourier transform infrared spectroscopy of effluents from pulsed plasmas of 1,1,2,2-tetrafluoroethane, hexafluoropropylene oxide, and difluoromethane

1999 Journal of Vacuum Science and Technology
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Pulsed plasma-enhanced chemical vapor deposition from CH 2 F 2 , C 2 H 2 F 4 , and CHClF 2

1999 Journal of Vacuum Science and Technology
- Catherine B. Labelle
- Karen K. Gleason
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Pulsed Plasma Enhanced Chemical Vapor Deposition from CH 2 F 2 , C 2 H 2 F 4 , and CHCIF 2

1998 MRS Proceedings
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Growth of fluorocarbon polymer thin films with high CF2 fractions and low dangling bond concentrations by thermal chemical vapor deposition

1996 Applied Physics Letters
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Citations (115)