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Geoff Gaines
Geoff Gaines
Lawrence Berkeley National Laboratory
Optics
Extreme ultraviolet lithography
Materials science
Aerial image
Lithography
4
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2
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How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive
2020
Christopher Anderson
Arnaud P. Allezy
Weilun Chao
Lucas Conley
Carl W. Cork
Will Cork
Rene Delano
Jason DePonte
M.R.Dickinson
Geoff Gaines
Jeff Gamsby
Eric M. Gullikson
Gideon Jones
Lauren McQuade
Ryan Miyakawa
Patrick P. Naulleau
Seno Rekawa
Farhad Salmassi
Brandon Vollmer
Daniel Zehm
Wenhua Zhu
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Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab
2019
Christopher N. Anderson
Arnaud P. Allezy
Weilun Chao
Carl W. Cork
Will Cork
Rene Delano
Jason DePonte
Michael R. Dickinson
Geoff Gaines
Jeff Gamsby
Eric M. Gullikson
Gideon Jones
Stephen Meyers
Ryan Miyakawa
Patrick P. Naulleau
Senajith Rekawa
Farhad Salmassi
Brandon Vollmer
Daniel Zehm
Wenhua Zhu
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Achieving diffraction-limited performance on the Berkeley MET5
2019
Ryan Miyakawa
Christopher N. Anderson
Wenhua Zhu
Geoff Gaines
Jeff Gamsby
Carl W. Cork
Gideon Jones
Michael Dickenson
Seno Rekawa
Weilun Chao
Sharon Oh
Patrick P. Naulleau
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Berkeley MET5 update: commissioning, interferometry, and first prints (Conference Presentation)
2018
Ryan Miyakawa
Wenhua Zhu
Geoff Gaines
Christopher N. Anderson
Patrick P. Naulleau
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