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Will Cork
Will Cork
Lawrence Berkeley National Laboratory
Extreme ultraviolet lithography
Materials science
Optics
Resist
Extreme ultraviolet
2
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2
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How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive
2020
Christopher Anderson
Arnaud P. Allezy
Weilun Chao
Lucas Conley
Carl W. Cork
Will Cork
Rene Delano
Jason DePonte
M.R.Dickinson
Geoff Gaines
Jeff Gamsby
Eric M. Gullikson
Gideon Jones
Lauren McQuade
Ryan Miyakawa
Patrick P. Naulleau
Seno Rekawa
Farhad Salmassi
Brandon Vollmer
Daniel Zehm
Wenhua Zhu
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Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab
2019
Christopher N. Anderson
Arnaud P. Allezy
Weilun Chao
Carl W. Cork
Will Cork
Rene Delano
Jason DePonte
Michael R. Dickinson
Geoff Gaines
Jeff Gamsby
Eric M. Gullikson
Gideon Jones
Stephen Meyers
Ryan Miyakawa
Patrick P. Naulleau
Senajith Rekawa
Farhad Salmassi
Brandon Vollmer
Daniel Zehm
Wenhua Zhu
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