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Jeremy J. Kempisty
Jeremy J. Kempisty
IBM
CMOS
Electronic engineering
Optoelectronics
Physics
Epitaxy
3
Papers
47
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SiGe Selective Epitaxy: Morphology and Thickness Control for High Performance CMOS Technology
2008
Judson R. Holt
Eric C. Harley
Thomas N. Adam
Shwu-Jen Jeng
Keith H. Tabakman
Rohit Pal
Hasan M. Nayfeh
Linda Black
Jeremy J. Kempisty
Matthew W. Stoker
Abhishek Dube
Dominic J. Schepis
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High performance cmos bulk technology using direct silicon bond (dsb) mixed crystal orientation substrates
2005
IEDM | International Electron Devices Meeting
Chun-Yung Sung
Haizhou Yin
H. Ng
Katherine L. Saenger
Victor Chan
S. Crowder
Jinghong Li
J. A. Ott
R. Bendernagel
Jeremy J. Kempisty
Victor Ku
H.K. Lee
Zhijiong Luo
Anita Madan
R. Mo
P.Y. Nguyen
G. Pfeiffer
M. Raccioppo
Nivo Rovedo
D.K. Sadana
J. P. de Souza
Rong Zhang
Zhibin Ren
Clement Hsingjen Wann
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Citations (17)
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