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SiGe Selective Epitaxy: Morphology and Thickness Control for High Performance CMOS Technology
SiGe Selective Epitaxy: Morphology and Thickness Control for High Performance CMOS Technology
2008
Judson R. Holt
Eric C. Harley
Thomas N. Adam
Shwu-Jen Jeng
Keith H. Tabakman
Rohit Pal
Hasan M. Nayfeh
Linda Black
Jeremy J. Kempisty
Matthew W. Stoker
Abhishek Dube
Dominic J. Schepis
Keywords:
CMOS
Epitaxy
Electronic engineering
Materials science
Optoelectronics
Morphology (linguistics)
Correction
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