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Seunghyun Seok
Seunghyun Seok
Samsung
Plasma
Optoelectronics
Mass flow rate
Thin film
Computer network
2
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1
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A study on film thickness control of vertical flow showerhead reactor for RF plasma deposition
2017
MIPRO | International Convention on Information and Communication Technology, Electronics and Microelectronics
Guensuk Lee
Suhong Kim
Seunghyun Seok
Junsung Lee
Jin-Seok Lee
Sangjin Choi
Taeyang Yoon
Juhwan Park
Han Seo Ko
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A study on film thickness control of vertical flow showerhead reactor for RF plasma deposition
2017
ASMC | Advanced Semiconductor Manufacturing Conference
Guensuk Lee
Suhong Kim
Seunghyun Seok
Junsung Lee
Jin-Seok Lee
Sangjin Choi
Taeyang Yoon
Juhwan Park
Han Seo Ko
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