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Daniel Probst
Daniel Probst
Technische Universität Darmstadt
Materials science
Corrosion
Plasma-enhanced chemical vapor deposition
Inorganic chemistry
Analytical chemistry
8
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226
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Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide
2006
Journal of The European Ceramic Society
Yanping Zhou
Daniel Probst
A. Thissen
Edwin Kroke
Ralf Riedel
Ralf Hauser
Holger Hoche
Erhard Broszeit
Peter Kroll
Herbert Stafast
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Citations (41)
Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry
2005
Surface & Coatings Technology
Thomas Stelzner
M. Arold
Fritz Falk
Herbert Stafast
Daniel Probst
Holger Hoche
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Citations (16)
Surface treatment of metallic work pieces
2004
Daniel Probst
Christina Berger
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Plasma anodisation as an environmental harmless method for the corrosion protection of magnesium alloys
2003
Surface & Coatings Technology
Holger Hoche
Herbert Scheerer
Daniel Probst
Erhard Broszeit
Christina Berger
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Citations (34)
1