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Gabriel B. Perez
Gabriel B. Perez
SEMATECH
Polymer
Lithography
Photoresist
Thermal stability
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193-nm photoresists at 130-nm node: which lithographic performances for which chemical platform?
2000
Gilles R. Amblard
Jeff D. Byers
Wolf-Dieter Domke
Georgia K. Rich
Victoria L. Graffenberg
Shashikant Patel
Daniel Miller
Gabriel B. Perez
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