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Wolf-Dieter Domke
Wolf-Dieter Domke
SEMATECH
Photolithography
Resist
Optics
Lithography
Polymer
4
Papers
95
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193-nm photoresists at 130-nm node: which lithographic performances for which chemical platform?
2000
Gilles R. Amblard
Jeff D. Byers
Wolf-Dieter Domke
Georgia K. Rich
Victoria L. Graffenberg
Shashikant Patel
Daniel Miller
Gabriel B. Perez
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Citations (1)
Comparison of resist collapse properties for deep ultraviolet and 193 nm resist platforms
2000
Journal of Vacuum Science & Technology B
Heidi B. Cao
Paul F. Nealey
Wolf-Dieter Domke
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Citations (77)
Pattern collapse in high-aspect-ratio DUV and 193-nm resists
2000
Wolf-Dieter Domke
Victoria L. Graffenberg
Shashikant Patel
Georgia K. Rich
Heidi B. Cao
Paul F. Nealey
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Optical extension at the 193-nm wavelength
1999
Peter Zandbergen
Martin McCallum
Gilles R. Amblard
Wolf-Dieter Domke
Bruce W. Smith
Lena Zavyalova
John S. Petersen
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Citations (2)
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