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J. Aubert

University of Paris-Sud

5

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39

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Dry etching of magnetic tunnel junctions monitored by spectroscopic reflectance

2011 Materials Science in Semiconductor Processing
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Gold metallizations for eutectic bonding of silicon wafers

2006 DTIP | Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS
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A simple microwave component for the vacuum window protection in an ECR ion source for ion beam processing

2004 Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms
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An ECR microwave plasma cathode for ion sources with electrostatic reflex containment

1992 Review of Scientific Instruments
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Angular-resolved energy distribution of secondary ions emitted from a silicon target sputtered by a xenon ion beam

1992 Applied Physics A
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