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Matt J. Lamantia
Matt J. Lamantia
DuPont
Photomask
Wafer
Engineering
Lithography
Optics
5
Papers
9
Citations
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Imaging properties of a leading-edge DUV laser generated photomask
2004
Curt Jackson
Peter Buck
Sarah Cohen
Vishal Garg
Jason Hickethier
Charles H. Howard
Robert Kiefer
Matt J. Lamantia
John Manfredo
James Tsou
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Citations (1)
ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node
2002
Jerry Xiaoming Chen
John Riddick
Matt J. Lamantia
Azeddine Zerrade
Robert K. Henderson
Greg P. Hughes
Cyrus E. Tabery
Khoi A. Phan
Christopher A. Spence
Amy A. Winder
William A. Stanton
Eugene A. Delarosa
John Maltabes
Cecilia E. Philbin
Lloyd C. Litt
Anthony Vacca
Scott Pomeroy
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Reticle defect printability: their impact on yield and feedback to suppliers
2002
Robert Vinje
Arthur D. Klaum
David Chmielewski
Matt J. Lamantia
Dawn M. Woolery
Dianna Coburn
Colleen Weins
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Citations (2)
Correlation of reticle defects detectability and repairs to ArF wafer printability for 0.13-um design rule with binary OPC/SB mask
2001
Khoi A. Phan
Christopher A. Spence
John Riddick
Jerry Xiaoming Chen
Matt J. Lamantia
Hugo Villa
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