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Arthur D. Klaum
Arthur D. Klaum
KLA-Tencor
Engineering drawing
Wafer
Reticle
Photolithography
Engineering
4
Papers
3
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A new methodology to specify via and contact layer reticles for maximizing process latitude
2003
Kirk J. Strozewski
Joe Perez
Anthony Vacca
Arthur D. Klaum
Keith J. Brankner
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Defect dispositioning in a reticle qualification process
2002
Mark A. Hawkins
Arthur D. Klaum
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Reticle defect printability: their impact on yield and feedback to suppliers
2002
Robert Vinje
Arthur D. Klaum
David Chmielewski
Matt J. Lamantia
Dawn M. Woolery
Dianna Coburn
Colleen Weins
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Citations (2)
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