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Marie Angelopoulos

IBM

158

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2891

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X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films.

2005 Langmuir
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Water immersion of model photoresists: interfacial influences on water concentration and surface morphology

2005 Journal of Micro-nanolithography Mems and Moems
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X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films.

2004
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Formation of deprotected fuzzy blobs in chemically amplified resists

2004 Journal of Polymer Science Part B
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Surface Effects in Chemically Amplified Photoresists: Environmental Stability and Segregation

2004
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Interfacial effects on moisture absorption in thin polymer films.

2004 Langmuir
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Surface and bulk chemistry of chemically amplified photoresists: segregation in thin films and environmental stability issues

2004 Proceedings of SPIE
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Correlation of the Reaction Front With Roughness in Chemically Amplified Photoresists | NIST

2004
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Measurements of water distribution in thin lithographic films

2004
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Performance data on new tunable attenuating PSM for 193-nm and 157-nm lithography

2004
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