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Asai Masaya
Asai Masaya
Resist
Materials science
Extreme ultraviolet lithography
Engineering physics
Critical dimension
2
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Alternative EUVL resist processes for stochastic defect reduction
2020
Julius Joseph S. Santillan
Masahiko Harumoto
Tomohiro Motono
Harold Stokes
Chisayo Mori
Tanaka Yuji
Asai Masaya
Toshiro Itani
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High sensitivity non-CAR type hemicellulose resists for EUV Lithography
2020
Kazuyo Morita
Kimiko Yamamoto
Yasuaki Tanaka
Hiroki Tanaka
Masahiko Harumoto
Tanaka Yuji
Chisayo Mori
You Arisawa
Tomohiro Motono
Harold Stokes
Asai Masaya
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