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Y L Wei
Y L Wei
Xi'an Jiaotong-Liverpool University
Leakage (electronics)
Dielectric
Electronic engineering
Engineering
Threshold voltage
2
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2024
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Plasma-Enhanced Combustion-Processed Al 2 O 3 Gate Oxide for In 2 O 3 Thin Film Transistors
2019
ICICDT | International Conference on IC Design and Technology
Q H Liu
Chun Zhao
Ce Zhou Zhao
Ivona Z. Mitrovic
Steve Hall
W Y Xu
Li Yang
E G Lim
Q N Wang
Y L Wei
Y X Cao
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Plasma-Enhanced Combustion-Processed Al2O3 Gate Oxide for In2O3 Thin Film Transistors
2019
ICICDT | International Conference on IC Design and Technology
Q H Liu
Cezhou Zhao
Chun Zhao
Ivona Z. Mitrovic
Steve Hall
Wangying Xu
Li Yang
E G Lim
Q N Wang
Y L Wei
Y X Cao
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