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Frank A.J.M. Driessen
Frank A.J.M. Driessen
IMEC
Phase-shift mask
Optics
Lithography
Electronic engineering
Engineering
4
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8
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Full phase-shifting methodology for 65-nm node lithography
2003
Storage and Retrieval for Image and Video Databases
Christophe Pierrat
Frank A.J.M. Driessen
Geert Vandenberghe
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Citations (4)
Performance optimization of the double-exposure alternating PSM for (sub-)100-nm ICs
2002
Geert Vandenberghe
Frank A.J.M. Driessen
Paul J.M. Vanadrichem
Kurt G. Ronse
Jason Li
Linard Karklin
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Model-based corrections for complementary phase-shift mask toward 70-nm technology node
2002
Frank A.J.M. Driessen
Geert Vandenberghe
Monique Ercken
Patrick K. Montgomery
Kurt G. Ronse
Paul van Adrichem
Jason Li
Hua-Yu Liu
Linard Karklin
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Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node
2002
Frank A.J.M. Driessen
Paul van Adrichem
Vicky Philipsen
Rik Jonckheere
Hua-Yu Liu
Linard Karklin
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Citations (1)
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