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Model-based corrections for complementary phase-shift mask toward 70-nm technology node
Model-based corrections for complementary phase-shift mask toward 70-nm technology node
2002
Frank A.J.M. Driessen
Geert Vandenberghe
Monique Ercken
Patrick K. Montgomery
Kurt G. Ronse
Paul van Adrichem
Jason Li
Hua-Yu Liu
Linard Karklin
Keywords:
Optics
Physics
Phase-shift mask
Materials science
Correction
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