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Thorsten Schedel
Thorsten Schedel
Extreme ultraviolet
Extreme ultraviolet lithography
Optics
Optoelectronics
Materials science
4
Papers
8
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EUV repair process optimization and integration
2017
Pavel Nesladek
Alexander Lajn
Thorsten Schedel
Markus Bender
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Clean induced feature CD shift of EUV mask
2016
Pavel Nesladek
Thorsten Schedel
Markus Bender
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Influence of unit process interaction on EUV mask performance
2015
Pavel Nesladek
Tereza Steinhartová
Haiko Rolff
Thorsten Schedel
Markus Bender
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Towards the optical inspection sensitivity optimization of EUV masks and EUVL-exposed wafers
2012
Uzodinma Okoroanyanwu
J. Heumann
X. Zhu
Chris Clifford
Fan Jiang
Pawitter Mangat
R. Ghaskadavi
E. Mohn
R. Moses
Obert Wood
Haiko Rolff
Thorsten Schedel
R. Cantrell
Pavel Nesladek
N. LiCausi
X. Cai
W. Taylor
Jeffrey Schefske
Markus Bender
N. Schmidt
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Citations (8)
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