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N. Schmidt
N. Schmidt
KLA-Tencor
Mask inspection
Wafer
Engineering
Extreme ultraviolet lithography
Optics
4
Papers
11
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Etch process monitoring possibilities and root cause analysis
2016
ASMC | Advanced Semiconductor Manufacturing Conference
Tetyana Shapoval
J. Engelmann
C. Kroh
N. Schmidt
S. Agarwal
Roshita Ramkhalawon
A. Cangiano
L. Debarge
Ronny Haupt
Robert Melzer
Carsten Hartig
Bernd Schulz
A. Reichel
Rolf Seltmann
Matthias Ruhm
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Citations (1)
Towards the optical inspection sensitivity optimization of EUV masks and EUVL-exposed wafers
2012
Uzodinma Okoroanyanwu
J. Heumann
X. Zhu
Chris Clifford
Fan Jiang
Pawitter Mangat
R. Ghaskadavi
E. Mohn
R. Moses
Obert Wood
Haiko Rolff
Thorsten Schedel
R. Cantrell
Pavel Nesladek
N. LiCausi
X. Cai
W. Taylor
Jeffrey Schefske
Markus Bender
N. Schmidt
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Citations (8)
Defect printability and inspectability of Cr-less phase-shift masks for the 70nm node
2005
Jan Heumann
J. Schramm
A. Birnstein
K.T. Park
T Witte
Nicolo Morgana
Mario Hennig
Rainer Pforr
Jörg Thiele
N. Schmidt
C. Aquino
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Citations (2)
Detailed characterization of inspection tools : Capabilities and limitations of the KLA 576
2005
J. Heumann
R. Moses
C. Holfeld
N. Schmidt
C. Aquino
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Citations (0)
1