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Sangdeok Kim
Sangdeok Kim
Thin film
Analytical chemistry
Oxygen
Molecule
Oxide
1
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8
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Plasma-free atomic layer deposition of Ru thin films using H2 molecules as a nonoxidizing reactant
2016
Journal of Vacuum Science and Technology
Seung Joon Lee
Soo Hyun Kim
Masayuki Saito
Kazuharu Suzuki
Shunichi Nabeya
Jeongyeop Lee
Sangdeok Kim
Seung-Jin Yeom
Do-Joong Lee
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Citations (8)
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