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Shunichi Nabeya
Shunichi Nabeya
Yeungnam University
Atomic layer deposition
Thin film
Chemistry
Inorganic chemistry
Analytical chemistry
5
Papers
30
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Selective Atomic Layer Deposition of Metals on Graphene for Transparent Conducting Electrode Application
2020
ACS Applied Materials & Interfaces
Minsu Kim
Shunichi Nabeya
Seung-Min Han
Min-Sik Kim
Sangbong Lee
Hyun-Mi Kim
Seong-Yong Cho
Do-Joong Lee
Soo Hyun Kim
Ki-Bum Kim
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Citations (7)
Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu
2020
Journal of Vacuum Science and Technology
Seung-Min Han
Dip K. Nandi
Yong-Hwan Joo
Toshiyuki Shigetomi
Kazuharu Suzuki
Shunichi Nabeya
Ryosuke Harada
Soo Hyun Kim
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Low temperature atomic layer deposition of Ru thin films using a new carbonyl-based Ru precursor and non-oxidizing reactants; Applications to the seed layer for Cu metallization
2017
IITC | International Interconnect Technology Conference
Hyun-Jung Lee
Shunichi Nabeya
Tae Eun Hong
Ryosuke Harada
Soo Hyun Kim
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Citations (2)
Plasma-free atomic layer deposition of Ru thin films using H2 molecules as a nonoxidizing reactant
2016
Journal of Vacuum Science and Technology
Seung Joon Lee
Soo Hyun Kim
Masayuki Saito
Kazuharu Suzuki
Shunichi Nabeya
Jeongyeop Lee
Sangdeok Kim
Seung-Jin Yeom
Do-Joong Lee
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Citations (8)
1