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Ted A. Paxton
Ted A. Paxton
ASML Holding
Resist
Composite material
Materials science
Photolithography
Critical dimension
4
Papers
11
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Pattern collapse and line width roughness reduction by surface conditioner solutions for 248-nm lithography
2005
Peng Zhang
Madhukar Bhaskara Rao
Manuel Jaramillo
Bridget Horvath
Brenda Ross
Ted A. Paxton
Todd Davis
Pat Cook
David Witko
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Impact of surfactant in developer on CD performance
2003
Peng Zhang
Manuel Jaramillo
Danielle M. King
Thomas John Markley
Zarka Zarkov
David Witko
Ted A. Paxton
Todd Davis
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Impact of surfactant in developer and rinse solution on 193-nm lithography performance
2003
Peng Zhang
Manuel Jaramillo
Danielle M. King
Brenda Ross
David Witko
Ted A. Paxton
Todd Davis
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DualBeam metrology: a new technique for optimizing 0.13-um photo processes
2001
Steven D. Berger
Denis Desloge
Robert J. Virgalla
Todd Davis
Ted A. Paxton
David Witko
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Citations (3)
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