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Bobby Rogers
Bobby Rogers
Electronic engineering
Limiting factor
Ion implantation
Gate oxide
Ion current
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Characterizing electron shower with CHARM(R)-2 wafers on Eaten NV-8200P medium current ion implanter
1999
Sealing Technology
Steve Reno
H. Gonzalez
C. Messick
W. Lukaszek
D.A. St.Angelo
Klaus Becker
Bobby Rogers
T. Romanski
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