Old Web
English
Sign In
Acemap
>
authorDetail
>
A. Waite
A. Waite
Applied Materials
Metal gate
Physics
Electronic engineering
Logic gate
Ion implantation
2
Papers
1
Citations
0
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (2)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
高温イオン注入によるバルクSi FinFETのCMOS特性の改善【Powered by NICT】
2016
Yoshiaki Kikuchi
Toby Hopf
G. Mannaert
Zheng Tao
A. Waite
J. Cournoyer
Jose Ignacio del Agua Borniquel
R. Schreutelkamp
Romain Ritzenthaler
Min-Soo Kim
S. Kubicek
Soon Aik Chew
K. Devriendt
Tom Schram
Steven Demuynck
Naushad Variam
Naoto Horiguchi
D. Mocuta
Show All
Source
Cite
Save
Citations (0)
Improvement of the CMOS characteristics of bulk Si FinFETs by high temperature ion implantation
2016
IEDM | International Electron Devices Meeting
Yoshiaki Kikuchi
Toby Hopf
G. Mannaert
Zheng Tao
A. Waite
J. Cournoyer
Jose Ignacio del Agua Borniquel
R. Schreutelkamp
Romain Ritzenthaler
Min-Soo Kim
S. Kubicek
Soon Aik Chew
K. Devriendt
Tom Schram
Steven Demuynck
Naushad Variam
Naoto Horiguchi
D. Mocuta
Show All
Source
Cite
Save
Citations (1)
1