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David Hasselbeck
David Hasselbeck
IBM
Adhesive
Photolithography
Flatness (systems theory)
Distortion
Photomask
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Effect of Pellicle Frame and Adhesive Material on Final Photomask Flatness
2009
Nancy Zhou
Ken Racette
David Hasselbeck
Monica Barrett
Robert Nolan
Michael Caterer
Takashi Mizoguchi
Satoshi Akutagawa
Glenn Dickey
Toru Shirasaki
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