Effect of Pellicle Frame and Adhesive Material on Final Photomask Flatness
2009
Previous work has shown that photomask blank flatness as well as photomask patterning and pelliclization all play an
important role in finished photomask flatness. Additional studies have shown that pellicle mounting techniques,
pellicle adhesives, frame flatness and shape and pellicle mounting tools play a role as well. It has become clear that
frame flexibility, coupled with frame mounting surface flatness and shape are the principal factors influencing the
pellicle effect on the mask distortion. Pellicle suppliers have begun to evaluate various polymers as potential
replacements for the standard aluminum frame in current use. The elasticity of the frame adhesive has also been adjusted
to evaluate its effect on the pellicle influence on mask flatness.
This paper describes some joint evaluations between IBM, Toppan and ShinEtsu, performed to determine the effect of
pellicle frame composition,, mount surface flatness, adhesive elasticity and adhesive surface flatness on the distortion of
photolithography masks. It demonstrates that polymer pellicle frames with more flexible adhesive improve finished
mask flatness approximately the same amount as reducing the total frame standoff height of aluminum frames with
conventional adhesive.
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