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Mark R. Tesauro
Mark R. Tesauro
STMicroelectronics
Thin film
Photoresist
Depth of focus
Photolithography
Resist
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Process effects resulting from an increased BARC thickness
1997
Ronald J. Eakin
Shangting F. Detweiler
Gregory J. Stagaman
Mark R. Tesauro
A Mark
Ralph R. Dammel
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