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L. Hobbs
L. Hobbs
Katholieke Universiteit Leuven
Dopant
Diode
Thermal stability
Analytical chemistry
Silicide
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Comparison between CoSi2 and TiSi2 as dopant source for shallow silicided junction formation
1989
Applied Surface Science
L. Van den hove
Karen Maex
L. Hobbs
P. Pippens
R. De Keersmaecker
Volker Probst
H. Schaber
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Citations (30)
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