Old Web
English
Sign In
Acemap
>
authorDetail
>
Jouke Krist
Jouke Krist
ASML Holding
Wafer
Scanner
Reticle
Lithography
Flatness (systems theory)
3
Papers
22
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (3)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Etch, reticle, and track CD fingerprint corrections with local dose compensation
2005
Hans Van Der Laan
Rene Carpaij
Jouke Krist
Oscar Noordman
Youri van Dommelen
Jan van Schoot
Frans Blok
Christian van Os
Sander Stegeman
Tom Hoogenboom
Craig Hickman
Erik Byers
Troy V. Gugel
Show All
Source
Cite
Save
Citations (6)
Study of the influence of substrate topography on the focusing performance of advanced lithography scanners
2003
Bruno La Fontaine
Jan Hauschild
Mircea Dusa
Alden Acheta
Eric M. Apelgren
Marc Boonman
Jouke Krist
Ashok M. Khathuria
Harry J. Levinson
Anita Fumar-Pici
Marco Pieters
Show All
Source
Cite
Save
Citations (9)
Analysis of focus errors in lithography using phase-shift monitors
2002
Bruno La Fontaine
Mircea Dusa
Jouke Krist
Alden Acheta
Jongwook Kye
Harry J. Levinson
Carlo Cornelis Maria Luijten
Craig B. Sager
Jack J. Thomas
Judith van Praagh
Show All
Source
Cite
Save
Citations (7)
1