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Zhijian G. Lu
Zhijian G. Lu
Infineon Technologies
Nanotechnology
Resist
Materials science
Copper interconnect
Engineering
4
Papers
4
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0
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When is bilayer thin-film imaging suitable: comparison with single-layer resists
2001
Scott Halle
Alan C. Thomas
Michael D. Armacost
Timothy J. Dalton
Xiaochun Chen
Scott J. Bukofsky
Oliver Genz
Zhijian G. Lu
Shahid Butt
Zheng Chen
Richard A. Ferguson
Eric M. Coker
Robert K. Leidy
Qinghuang Lin
Arpan P. Mahorowala
Katherina Babich
Karen Petrillo
Marie Angelopoulos
Mark Ignatowicz
Bang Bui
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Citations (3)
Defect printing issues with high-contrast chemically amplified resists
2000
Zhijian G. Lu
Wayne M. Moreau
Xiaoming Yin
K. Rex Chen
Alan C. Thomas
Peggy Lawson
George M. Jordhamo
ChungHsi J. Wu
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Citations (1)
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