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Shi-Hui Jen
Shi-Hui Jen
SEMATECH
Extreme ultraviolet
Shot noise
Photoresist
Phase-shift mask
Resist
1
Papers
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EUV Resists: Pushing to the Extreme
2014
Journal of Photopolymer Science and Technology
Patrick P. Naulleau
Christopher N. Anderson
Weilun Chao
Suchit Bhattarai
Andrew R. Neureuther
Kevin Cummings
Shi-Hui Jen
Mark Neisser
Bryan Thomas
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