Old Web
English
Sign In
Acemap
>
Paper
>
EUV Resists: Pushing to the Extreme
EUV Resists: Pushing to the Extreme
2014
Patrick P. Naulleau
Christopher N. Anderson
Weilun Chao
Suchit Bhattarai
Andrew R. Neureuther
Kevin Cummings
Shi-Hui Jen
Mark Neisser
Bryan Thomas
Keywords:
Extreme ultraviolet
Shot noise
Photoresist
Phase-shift mask
Resist
Materials science
Extreme ultraviolet lithography
Optics
Correction
Source
Cite
Save
Machine Reading By IdeaReader
11
References
9
Citations
NaN
KQI
[]