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F. C. Dassapa

Centre national d'études des télécommunications

3

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SIMS depth profiles study of WSi structures produced via the silicon reduction of tungsten hexafluoride

1993 Thin Solid Films
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Silicide formation in metal/Si structures and diffusion barrier properties of CVD tungsten films

1989 Journal of Materials Research
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The influence of an aluminum overlayer on the interaction of tungsten films with silicon substrates

1988 Journal of Vacuum Science & Technology B
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