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B. Sijmus

Katholieke Universiteit Leuven

Electronic engineering
Work function
Time-dependent gate oxide breakdown
CMOS
Electron mobility

3

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Highly reliable and extremely stable SiGe micro-mirrors

2007 MEMS | International Conference on Micro Electro Mechanical Systems
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Work function engineering by FUSI and its impact on the performance and reliability of oxynitride and Hf-silicate based MOSFETs

2004 IEDM | International Electron Devices Meeting
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