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Chin Kuei Chang
Chin Kuei Chang
United Microelectronics Corporation
Wafer
Reticle
Wafer fabrication
Computer science
Lithography
4
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2024
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Lithography printability review: the ultimate step in reticle analyzer to avoid killer mask defects in wafer fab manufacturing
2021
Frank Cm Wu
Chin Kuei Chang
Chain Ping Chen
Dongmei Wu
Wei Chen
Jinhua Zeng
Suo Li
Le Wang
Vikram Tolani
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Automatic classification of patterned mask defects for requalification at wafer fabs in absence of layout data
2020
Samir Bhamidipati
Prakash Deep
Mark Pereira
Sankaranarayanan Paninjath
Peter Buck
Keitaro Katabuchi
Frank Cm Wu
Chin Kuei Chang
Chain Ping Chen
Takenori Kato
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Demonstrating the value of integrated reticle automation solutions in high volume wafer fab manufacturing
2019
Chien-ming Wu
Chin Kuei Chang
Yousheng Yin
Jeffery Liang
Chia-Ping Chen
Wei Chen
Donghwan Song
Jinghua Zeng
Kunal Rohilla
Alexander Tan
Steven Liu
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In die mask overlay control for 14nm double-patterning lithography
2015
William Chou
James Cheng
Alex Tseng
J. K. Wu
Chin Kuei Chang
Jeffrey Cheng
Adder Lee
Chain Ting Huang
N. T. Peng
Simon C. C. Hsu
Chun-Chi Yu
Colbert Lu
Julia Yu
Peter Craig
Chuck Pollock
Young Ham
Jeff McMurran
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