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Seong Duk Jo
Seong Duk Jo
Polymer
Maleic anhydride
Transmittance
Photoresist
Lithography
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New approach for 193-nm resist using modified cycloolefin resin
2002
Joo-Hyeon Park
Dong-Chul Seo
Chang Min Kim
Young Tak Lim
Seong Duk Jo
Jong-Bum Lee
Hyeon Sang Joo
Hyun Pyo Jeon
Seong-Ju Kim
Jae-Chang Jung
Ki Soo Shin
Keun-Kyu Kong
Tatsuya Yamada
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