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Yury Lebedinskii

Moscow Institute of Physics and Technology

6

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42

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Band Alignment of Graphene/MoS 2 /Fluorine Tin Oxide Heterojunction for Photodetector Application

2021 Physica Status Solidi (a)
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Influence of the Annealing Temperature and Applied Electric Field on the Reliability of TiN/Hf0.5Zr0.5O2/TiN Capacitors

2021
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Radical-Enhanced Atomic Layer Deposition of Tungsten Oxide Film with a Tunable Oxygen Vacancy Concentration

2020 Journal of Physical Chemistry C
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Radical-Enhanced Atomic Layer Deposition of a Tungsten Oxide Film with the Tunable Oxygen Vacancy Concentration

2020 The Journal of Physical Chemistry
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FerroelectricSecond-Order Memristor

2019 ACS Applied Materials & Interfaces
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Citations (29)