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Joseph Ervin
Joseph Ervin
Electronic engineering
Silicon
Materials science
Fin
Physics
5
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6
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Virtual fabrication and advanced process control improve yield for SAQP process assessment with 16 nm half-pitch
2019
Benjamin Vincent
Stephane Larivière
Christopher J. Wilson
Ryan Kim
Joseph Ervin
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Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond
2019
Sylvain Baudot
Assawer Soussou
Alexey Milenin
Toby Hopf
Shouhua Wang
Pieter Wecks
Benjamin Vincent
Joseph Ervin
Steven Demuynck
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N7 FinFET Self-Aligned Quadruple Patterning Modeling
2018
SISPAD | International Conference on Simulation of Semiconductor Processes and Devices
Sylvain Baudot
Sofiane Guissi
Alexey Milenin
Joseph Ervin
Tom Schram
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Self-aligned block and fully self-aligned via for iN5 metal 2 self-aligned quadruple patterning
2018
Benjamin Vincent
Joern-Holger Franke
Aurelie Juncker
Frederic Lazzarino
Gayle Murdoch
Sandip Halder
Joseph Ervin
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High-Voltage CMOS Compatible SOIMESFETCharacterization and Spice ModelExtraction
2006
International Microwave Symposium
Joseph Ervin
Jinman Yang
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