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A. Girard

University of Nantes

Analytical chemistry
Nanotechnology
Etching
Physics
Physisorption

2

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Surface composition and micromasking effect during the etching of amorphous Ge-Sb-Se thin films in SF6 and SF6/Ar plasmas

2021 Applied Surface Science
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The role of physisorption in the cryogenic etching process of silicon

2019 Japanese Journal of Applied Physics
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