Old Web
English
Sign In
Acemap
>
Paper
>
The role of physisorption in the cryogenic etching process of silicon
The role of physisorption in the cryogenic etching process of silicon
2019
G. Antoun
Remi Dussart
Thomas Tillocher
Philippe Lefaucheux
Christophe Cardinaud
A. Girard
S. Tahara
K. Yamazaki
K. Yatsuda
J. Faguet
Kaoru Maekawa
Keywords:
Nanotechnology
Analytical chemistry
Etching
Physics
Physisorption
Silicon
Correction
Source
Cite
Save
Machine Reading By IdeaReader
29
References
1
Citations
NaN
KQI
[]